Search for: All records

The nature of structural changes of nanosecond laser modification inside silicon is investigated. Raman spectroscopy and transmission electron microscopy measurements of cross sections of the modified channels reveal highly localized crystal deformation. Raman spectroscopy measurements prove the existence of amorphous silicon inside nanosecond laser induced modifications, and the percentage of amorphous silicon is calculated based on the Raman spectrum. For the first time, the high-resolution transmission electron microscopy images directly show the appearance of amorphous silicon inside nanosecond laser induced modifications, which corroborates the indirect measurements from Raman spectroscopy. The laser modified channel consists of a small amount of amorphous silicon embedded in a disturbed crystal structure accompanied by strain. This finding may explain the origin of the positive refractive index change associated with the written channels that may serve as optical waveguides. 

The concept for fabrication of waveguides by an in‐volume laser direct writing in single‐crystal silicon is explored using a nanosecond pulse laser. The key innovation of this technology relies on the generation of amorphous silicon, which has a higher refractive index than that of crystalline silicon. Herein, transmission electron microscopy (TEM) together with selected area electron diffraction (SAED) and high‐resolution TEM (HRTEM) characterizations are used to better understand the microstructural evolutions. TEM images reveal the core‐shell structures, while SAED patterns and HRTEM directly observe the presence of amorphous silicon in the core surrounded by a crystalline silicon shell. With a lower laser scanning speed, a higher density of defects yet less amorphous silicon is formed by laser direct writing.